发明名称 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
摘要 Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) an onium salt containing a nitrogen atom in its cation moiety, which onium salt when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, and (C) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of compounds of general formulae (1-1) and (1-2) below.;
申请公布号 US8951890(B2) 申请公布日期 2015.02.10
申请号 US201113637825 申请日期 2011.12.22
申请人 FUJIFILM Corporation 发明人 Yamamoto Kei;Fujita Mitsuhiro;Matsuda Tomoki
分类号 H01L21/301;H01L23/58;G03F7/004;G03F7/039;G03F7/20 主分类号 H01L21/301
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. An actinic-ray- or radiation-sensitive resin composition comprising: (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) an onium salt containing a nitrogen atom in its cation moiety, which onium salt when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, and (C) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of compounds of general formulae (1-1) and (1-2) below, wherein the onium salt (B) consists of a cation and an anion, in general formula (1-1), R13 represents a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group or a group with a mono- or polycycloalkyl skeleton, R14, or each of R14s independently, represents an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, an alkylcarbonyl group, an alkylsulfonyl group, a cycloalkylsulfonyl group or a group with a mono- or polycycloalkyl skeleton, each of R15s independently represents an alkyl group, a cycloalkyl group or a naphthyl group, provided that two R15s may be bonded to each other to thereby form a ring, 1 is an integer of 0 to 2, r is an integer of 0 to 8, and X− represents a nonnucleophilic anion, and in general formula (1-2), M represents an alkyl group, a cycloalkyl group, an aryl group or a benzyl group, provided that when a cyclic structure is contained, the cyclic structure may contain an oxygen atom, a sulfur atom, an ester bond, an amido bond or a carbon to carbon double bond, each of R1c and R2c independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an aryl group, each of Rx and Ry independently represents an alkyl group, a cycloalkyl group, a 2-oxoalkyl group, an alkoxycarbonylalkyl group, an allyl group or a vinyl group, provided that Rx and Ry may be bonded to each other to thereby form a ring, and provided that at least two of M, R1c and R2c may be bonded to each other to thereby form a ring, which ring may contain a carbon to carbon double bond, and X− represents a nonnucleophilic anion.
地址 Tokyo JP