| 发明名称 | System and method for electromagnetic interference shielding for critical dimension-scanning electron microscope | ||
| 摘要 | System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer. | ||
| 申请公布号 | US8952330(B2) | 申请公布日期 | 2015.02.10 |
| 申请号 | US201414158591 | 申请日期 | 2014.01.17 |
| 申请人 | Taiwan Semiconductor Manufacturing Company, Ltd. | 发明人 | Tsao Chia-Chi;Jhan Syun-Jie;Shih Yi-Cheng;Yu Chwen |
| 分类号 | G01N23/00;G21K7/00;H01J37/244;H01J37/26;H01J37/28;H01J37/09 | 主分类号 | G01N23/00 |
| 代理机构 | Haynes and Boone, LLP | 代理人 | Haynes and Boone, LLP |
| 主权项 | 1. A scanning electron microscope (“SEM”) comprising: an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; a magnetic shield disposed around and enclosing the SE detector. | ||
| 地址 | Hsin-Chu TW | ||