| 摘要 |
<p>Disclosed is a substrate cleaning apparatus capable of preventing a substrate from being contaminated due to the remaining cleaning solutions. The substrate cleaning apparatus includes a cleaning bath which receives the cleaning solutions and in which a cleaning process for a plurality of substrates is performed and a guide unit which includes a plurality of slots to receive the substrates and moves to the inside or the outside of the cleaning bath. When the guide unit is raised in the cleaning bath, a suction hole to suck and remove the cleaning solutions which remain in the slot is formed in the slot.</p> |
