发明名称 |
X-ray stress measurement method and apparatus |
摘要 |
A sample (1) is irradiated with X-rays at different incident angles from plural X-ray sources (21, 22). Attention is focused on a Debye-ring of each X-ray diffraction emitted conically from the sample in association with incident X-ray from each of the X-ray sources (21, 22), and stress in the sample (1) is determined on the basis of information of X-ray diffraction appearing at an intersection point between the Debye-ring of the X-ray diffraction recorded on an image plate (30) and an equatorial plane (H) and information of X-ray diffraction appearing in the neighborhood of the intersection point between the Debye-ring and the equatorial plane (H). |
申请公布号 |
US8953743(B2) |
申请公布日期 |
2015.02.10 |
申请号 |
US201313917829 |
申请日期 |
2013.06.14 |
申请人 |
Rigaku Corporation |
发明人 |
Yasukawa Shoichi |
分类号 |
G01N23/20;G01L1/25;G01N23/207 |
主分类号 |
G01N23/20 |
代理机构 |
Westerman, Hattori, Daniels & Adrian, LLP |
代理人 |
Westerman, Hattori, Daniels & Adrian, LLP |
主权项 |
1. An X-ray stress measurement method comprising:
irradiating a sample with X-rays at a plurality of different incident angles from a plurality of X-ray sources; focusing attention on a Debye-ring of each X-ray diffraction radiated conically from the sample in association with incident X-ray emitted from each of the X-ray sources; and determining stress in the sample on the basis of information of X-ray diffraction appearing at an intersection point between the Debye-ring and an equatorial plane containing an optical axis of the incident X-ray emitted from each of the X-ray sources, and information of X-ray diffraction appearing at a point on the Debye-ring other than the intersection point between the Debye-ring and the equatorial plane. |
地址 |
Tokyo JP |