发明名称 Substrate for an electrowetting display device and method of manufacturing the substrate
摘要 A substrate for an electrowetting display device including a pixel electrode, a partition wall pattern and a water-repellent pattern. The pixel electrode is formed on a base substrate. The partition wall pattern is disposed along an edge of the pixel electrode to expose the pixel electrode. The water-repellent pattern is disposed at a space formed by the pixel electrode and the partition wall pattern to be extended along a lower portion of side surfaces of the partition wall pattern from an area on which the pixel electrode is formed. The water-repellent pattern exposes an upper portion of the side surfaces and an upper surface of the partition wall pattern. Thus, a manufacturing reliability of a substrate for an electrowetting display device is improved to prevent a display quality from being reduced.
申请公布号 US8951424(B2) 申请公布日期 2015.02.10
申请号 US201213601297 申请日期 2012.08.31
申请人 Amazon Technologies, Inc. 发明人 Shim Seung Bo;Ju Jin-Ho;Kim Dae Ho;Kim Sang-Il;Park Sung-Kyun;Lyu Jae-Jin
分类号 H01B13/00 主分类号 H01B13/00
代理机构 Lee & Hayes, PLLC 代理人 Lee & Hayes, PLLC
主权项 1. A method of manufacturing a substrate for an electrowetting display device, the method comprising: forming a preliminary partition wall pattern on a base substrate on which a pixel electrode is formed; forming a water-repellent layer on the base substrate having the preliminary partition wall pattern, wherein the water-repellent layer covers the preliminary partition wall pattern; forming a mask pattern on the base substrate, the mask pattern exposing an upper surface of the preliminary partition wall pattern and an upper portion of side surfaces of the preliminary partition wall pattern connected to the upper surface; forming a water-repellent pattern by removing the water-repellent layer covering an upper portion of the preliminary partition wall pattern; forming a partition wall pattern, which is lower than a height of the preliminary partition wall pattern, by removing the upper portion of the preliminary partition wall exposed by the mask pattern and the water-repellent pattern; and removing the mask pattern from the base substrate on which the water-repellent pattern and the partition wall pattern are formed.
地址 Reno NV US