Contour alignment system

摘要

The present disclosure describes a method of calibrating a contour. The method includes designing an anchor pattern, printing the anchor pattern on a substrate, collecting scanning electron microscope (SEM) data of the printed anchor pattern on the substrate, wherein the SEM data includes a SEM image of the printed anchor pattern on the substrate, converting the SEM image of the printed anchor pattern on the substrate into a SEM contour of the printed anchor pattern, analyzing the SEM contour of the printed anchor pattern, and aligning the SEM contour of the anchor pattern to form the calibrated SEM contour.

主权项

1. A method of calibrating a contour, the method performed by a data processor, the method comprising:
with the data processor, designing a pattern, wherein the pattern includes a designed anchor pattern and a designed verification pattern to be printed onto a substrate; collecting scanning electron microscope (SEM) data of a printed anchor pattern on the substrate, wherein the SEM data includes a SEM image of the printed anchor pattern on the substrate; converting the SEM image of the printed anchor pattern on the substrate into a SEM contour of the printed anchor pattern; analyzing the SEM contour of the printed anchor pattern, wherein analyzing the SEM contour of the printed anchor pattern includes measuring a distance between the SEM contour of the printed anchor pattern and the designed anchor pattern at a contour point; and aligning the SEM contour of the anchor pattern, to calibrate the SEM contour.