发明名称 |
Methods for fabrication of an air gap-containing interconnect structure |
摘要 |
Methods for producing air gap-containing metal-insulator interconnect structures for VLSI and ULSI devices using a photo-patternable low k material as well as the air gap-containing interconnect structure that is formed are disclosed. More particularly, the methods described herein provide interconnect structures built in a photo-patternable low k material in which air gaps are defined by photolithography in the photo-patternable low k material. In the methods of the present invention, no etch step is required to form the air gaps. Since no etch step is required in forming the air gaps within the photo-patternable low k material, the methods disclosed in this invention provide highly reliable interconnect structures. |
申请公布号 |
US8952539(B2) |
申请公布日期 |
2015.02.10 |
申请号 |
US201414157098 |
申请日期 |
2014.01.16 |
申请人 |
International Business Machines Corporation |
发明人 |
Clevenger Lawrence A.;Darnon Maxime;Nitta Satyanarayana V.;Lisi Anthony D.;Lin Qinghuang |
分类号 |
H01L23/538;H01L23/482;H01L21/02;H01L21/31;H01L21/3105;H01L21/768;H01L23/522;H01L23/532;C08L83/04 |
主分类号 |
H01L23/538 |
代理机构 |
Scully, Scott, Murphy & Presser, P.C. |
代理人 |
Scully, Scott, Murphy & Presser, P.C. ;Percello, Esq. Lous J. |
主权项 |
1. An interconnect structure comprising:
a cured photo-patternable low k (PPLK) material located atop a substrate, wherein said cured PPLK material includes a plurality of conductively filled openings located therein; at least one air gap located within said cured PPLK material between preselected neighboring conductively filled openings, but not directly beneath said conductively filled openings, wherein a vertical portion of the at least one air gap directly contacts a diffusion barrier layer lining sidewall surfaces of said conductively filled openings and a bottommost surface of said at least one air gap directly contacts a portion of said cured PPLK material; and a dielectric cap located atop said cured PPLK material and atop said at least one air gap. |
地址 |
Armonk NY US |