发明名称 |
Electrochemical cell structure and method of fabrication |
摘要 |
One limitation to the realisation of mass produced electrochemical cells is a lack of high resolution patterning techniques providing accurate alignment. A method of fabricating a patterned structure on a polymer layer for the manufacture of an electrochemical cell is provided. The method comprises: depositing a polymer layer upon a substrate; and stamping the polymer layer to form an embossed polymer layer using an embossing tool, the embossing tool having a first array of adjacent cells, spaced from one another and extending from the stamping face of the embossing tool and thereby forming a second array of adjacent cells, spaced from one another and extending as cavities within the embossed polymer layer. |
申请公布号 |
US8951601(B2) |
申请公布日期 |
2015.02.10 |
申请号 |
US200611598738 |
申请日期 |
2006.11.14 |
申请人 |
Seiko Epson Corporation |
发明人 |
Li Shunpu;Ishida Masaya |
分类号 |
B05D5/12 |
主分类号 |
B05D5/12 |
代理机构 |
Oliff PLC |
代理人 |
Oliff PLC |
主权项 |
1. A method of forming a component of an electrochemical cell, comprising:
forming a first electrode on a substrate; forming a polymer layer on the first electrode; stamping the polymer layer to form a first embossed polymer layer using an embossing tool, the embossing tool having a pattern; removing the embossing tool from the polymer layer; and removing a part of the first embossed polymer layer to form a second embossed polymer layer, a part of the first electrode being exposed; and forming a metal oxide and a dye on an exposed electrode by an ink jet process, including depositing a metal oxide colloidal suspension and a dye solution into a cavity of the second embossed polymer layer by the ink jet process. |
地址 |
Tokyo JP |