发明名称 Electrochemical cell structure and method of fabrication
摘要 One limitation to the realisation of mass produced electrochemical cells is a lack of high resolution patterning techniques providing accurate alignment. A method of fabricating a patterned structure on a polymer layer for the manufacture of an electrochemical cell is provided. The method comprises: depositing a polymer layer upon a substrate; and stamping the polymer layer to form an embossed polymer layer using an embossing tool, the embossing tool having a first array of adjacent cells, spaced from one another and extending from the stamping face of the embossing tool and thereby forming a second array of adjacent cells, spaced from one another and extending as cavities within the embossed polymer layer.
申请公布号 US8951601(B2) 申请公布日期 2015.02.10
申请号 US200611598738 申请日期 2006.11.14
申请人 Seiko Epson Corporation 发明人 Li Shunpu;Ishida Masaya
分类号 B05D5/12 主分类号 B05D5/12
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A method of forming a component of an electrochemical cell, comprising: forming a first electrode on a substrate; forming a polymer layer on the first electrode; stamping the polymer layer to form a first embossed polymer layer using an embossing tool, the embossing tool having a pattern; removing the embossing tool from the polymer layer; and removing a part of the first embossed polymer layer to form a second embossed polymer layer, a part of the first electrode being exposed; and forming a metal oxide and a dye on an exposed electrode by an ink jet process, including depositing a metal oxide colloidal suspension and a dye solution into a cavity of the second embossed polymer layer by the ink jet process.
地址 Tokyo JP
您可能感兴趣的专利