发明名称 |
Acetone gas sensor apparatus |
摘要 |
An acetone gas sensor apparatus, including: a chamber, used for containing a gas sample taken from a breath of a person; and an acetone gas sensor, placed in the chamber for generating an output current in response to an acetone concentration of the gas sample, the acetone gas sensor including: a substrate; a buffer layer, deposited on the substrate; an InN epilayer, deposited on the buffer layer for providing a current path for the output current; a first conductive contact, deposited on the InN epilayer for providing a drain contact; and a second conductive contact, deposited on the InN epilayer for providing a source contact. |
申请公布号 |
US8950240(B2) |
申请公布日期 |
2015.02.10 |
申请号 |
US201213432108 |
申请日期 |
2012.03.28 |
申请人 |
National Tsing Hua University |
发明人 |
Yeh Jer-Liang Andrew;Gwo Shang-Jr |
分类号 |
G01N33/497;G01N27/00;G01N1/22 |
主分类号 |
G01N33/497 |
代理机构 |
The Weintraub Group, P.L.C. |
代理人 |
The Weintraub Group, P.L.C. |
主权项 |
1. In an acetone gas sensor apparatus, the improvement comprising:
a chamber, for containing a gas sample taken from a breath of a person; and an acetone gas sensor, placed in said chamber for generating an output current in response to an acetone concentration of said gas sample, said acetone gas sensor comprising: a substrate which is a c-plane sapphire layer or a silicon layer; an AlN buffer layer, deposited on said substrate; an InN epilayer, deposited on said buffer layer for providing a current path for said output current; a first conductive contact, deposited on said InN epilayer for providing a drain contact; and a second conductive contact, deposited on said InN epilayer for providing a source contact. |
地址 |
Hsinchu TW |