| 摘要 |
FIELD: chemistry.SUBSTANCE: polishing composition contains water suspension of polishing powder - polirite and polyoxyalkyleneglycol as defoaming additive, with the following component ration, wt %: polyoxyalkyleneglycol 0.01-0.03; water suspension of polishing powder counted per 10% suspension - the remaining part.EFFECT: invention makes it possible to increase time of continuous work of polishing machines.6 tbl |
