| 摘要 |
<p>A plasma processing apparatus and a viewport included in the same are provided to effectively observe a plasma property inside a process chamber by removing a dead space through expansion of a viewing angle of a viewport. A fixed process is performed on a substrate by generating plasma inside a process chamber of vacuum state. A viewport is included in order to confirm a property of plasma generated inside the process chamber. The viewport(160) includes at least one through hole(161) and a reflective member(163). The through hole is formed in at least one among walls which form the process chamber. The reflective member is included in at least one part of an inner surface of the through hole, and reflects a light. A reflective surface of the reflective member is formed with a curved shape.</p> |
