| 摘要 |
<p>The present invention relates to a cleaning apparatus for a UV reactor that has an injection nozzle. The cleaning apparatus for a UV reactor can selectively remove contaminants and scale materials from a UV lamp of the UV reactor by cleaning the UV lamp of the UV reactor through the injection nozzle, and a compact design also can be obtained by reducing the volume of a CIP tank. In addition, the cleaning apparatus for a UV reactor can effectively collect cleaning solutions discharged from the UV reactor by sucking them regardless of the position of the UV reactor.</p> |
