| 摘要 |
<p>A vapor deposition device includes multiple evaporation units, a mixing unit, multiple connection units, and multiple evaporation sensor units. The evaporation units accommodate one or more deposition materials thereinside and the deposition materials are evaporated from the evaporation units. The deposition materials evaporated from the evaporation units are mixed in the mixing unit. The connection units are connected to the evaporation units and the mixing units and transfer the evaporated deposition materials. The evaporation sensor units are arranged outside the connection units and measure the concentration of the deposition materials transferred from the evaporation units. According to the vapor deposition device and the vapor deposition method using the same, the concentration of the deposition materials transferred from the evaporation units can be individually controlled and the vapor of the deposition materials can be uniformly mixed. Accordingly, a uniform deposition layer can be formed on the overall area of a substrate.</p> |
