| 摘要 |
<p>The present invention aims to provide a method for forming a nanostructure using a nanoimprint whereby nanostructures in various sizes can be formed by one mold. According to the present invention, the method includes the steps of: forming a first resist layer and a second resist layer on a substrate in order; preparing a mold including a body part and a nanopattern, which is extended from the body part and has a variable cross-sectional area; forming a pattern area to which the nanopattern is transferred by pressing the mold on the second resist layer in order to insert the nanopattern into the second resist layer; selectively etching the first resist layer in order to expose the substrate in the pattern area after removing the mold; and forming the nanostructure on the substrate using the second resist layer as a mask layer.</p> |
