CONFORMAL SIDEWALL PASSIVATION

摘要

A method for etching features into an etch layer in a stack disposed below a patterned mask with mask features is provided. Coating providing molecules are provided. The coating providing molecules are pyrolyzed, which only produces a first set of byproducts and a second set of byproducts, wherein the first set of byproducts have a sticking coefficient between 10−6 to 5×10−3 and wherein the second set of byproducts includes all remaining byproducts from the pyrolysis wherein all remaining byproducts from the pyrolysis have sticking coefficients less than 10−6. The stack is exposed to the first set of byproducts, causing the first set of byproducts to deposit a coating. The etch layer is etched.

主权项

1. A method for etching features into an etch layer in a stack disposed below a patterned mask with mask features, comprising:
providing coating providing molecules; pyrolyzing the coating providing molecules, which only produce a first set of byproducts and a second set of byproducts, wherein the first set of byproducts have a sticking coefficient between 10−6 to 5×10−3 and wherein the second set of byproducts includes all remaining byproducts from the pyrolysis wherein all remaining byproducts from the pyrolysis have sticking coefficients less than 10−6; exposing the stack to the first set of byproducts, causing the first set of byproducts to deposit a coating; and etching the etch layer.