APPARATUS AND METHOD FOR PROVIDING FLUID FOR IMMERSION LITHOGRAPHY

摘要

An immersion lithography system and method exposes a substrate through a liquid. The substrate is exposed through the liquid, which is provided between a final optical element of a projection lens and the substrate. The liquid is recovered from an upper surface of the substrate via a recovery opening of an immersion apparatus under which the substrate is positioned, the immersion apparatus being disposed around the final optical element of the projection lens. The a pressure for recovering the liquid from the upper surface of the substrate via the recovery opening is controlled by a pressure control system, the pressure control system having a first tank connected to the recovery opening via a recovery flow line and a vacuum regulator to control a pressure in the first tank.

主权项

1. An immersion lithography system in which a substrate is exposed through a liquid, the system comprising:
a projection lens; an immersion apparatus under which the substrate is positioned, the immersion apparatus is disposed around a final optical element of the projection lens, and the immersion apparatus including a recovery opening for recovering liquid from an upper surface of the substrate; and a pressure control system which controls a pressure for recovering the liquid from the upper surface of the substrate via the recovery opening, the pressure control system having a first tank connected to the recovery opening via a recovery flow line and a vacuum regulator to control a pressure in the first tank.