发明名称 ELASTIC WAVE DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 An elastic wave device includes a supporting substrate, a high-acoustic-velocity film stacked on the supporting substrate and in which an acoustic velocity of a bulk wave propagating therein is higher than an acoustic velocity of an elastic wave propagating in a piezoelectric film, a low-acoustic-velocity film stacked on the high-acoustic-velocity film and in which an acoustic velocity of a bulk wave propagating therein is lower than an acoustic velocity of a bulk wave propagating in the piezoelectric film, the piezoelectric film is stacked on the low-acoustic-velocity film, and an IDT electrode stacked on a surface of the piezoelectric film.
申请公布号 US2015033521(A1) 申请公布日期 2015.02.05
申请号 US201414488447 申请日期 2014.09.17
申请人 Murata Manufacturing Co., Ltd. 发明人 WATANABE Munehisa;IWAMOTO Hideki;KANDO Hajime;KIDO Syunsuke
分类号 H03H3/10 主分类号 H03H3/10
代理机构 代理人
主权项 1. A method for manufacturing an elastic wave device comprising: a step of preparing a supporting substrate; a step of forming a high-acoustic-velocity film, in which an acoustic velocity of a bulk wave propagating therein is higher than an acoustic velocity of an elastic wave propagating in a piezoelectric, on the supporting substrate; a step of forming a low-acoustic-velocity film, in which an acoustic velocity of a bulk wave propagating therein is lower than an acoustic velocity of a bulk wave propagating in a piezoelectric, on the high-acoustic-velocity film; a step of forming a piezoelectric layer on the low-acoustic-velocity film; and a step of forming an IDT electrode on a surface of the piezoelectric layer.
地址 Nagaokakyo-shi JP