发明名称 ELECTRON BEAM EQUIPMENT
摘要 To improve the efficiency of generation of chromatic aberrations of an energy filter for reducing energy distribution. Mounted are an energy filter for primary electrons, the energy filter having a beam slit and a pair of a magnetic deflector and an electrostatic deflector that are superimposed with each other. An electron lens is arranged between the beam slit and the pair of the magnetic deflector and the electrostatic deflector.
申请公布号 US2015034836(A1) 申请公布日期 2015.02.05
申请号 US201414445056 申请日期 2014.07.29
申请人 Hitachi High-Technologies Corporation 发明人 Sohda Yasunari;Ohashi Takeyoshi;Miwa Takafumi;Kawano Hajime
分类号 H01J37/30;H01J37/26;G21K1/093 主分类号 H01J37/30
代理机构 代理人
主权项 1. Electron beam equipment comprising: an electron gun configured to emit primary electrons; an energy filter configured to pass electrons with predetermined energy; a stage configured to hold a sample; and an objective lens configured to irradiate the sample held on the stage with the primary electrons that have passed through the energy filter, wherein the energy filter includes a beam slit and a pair of a magnetic deflector and an electrostatic deflector that are superimposed with each other, and an electron lens is provided between the beam slit and the pair of the magnetic deflector and the electrostatic deflector.
地址 Tokyo JP