发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes first and second electrodes. First semiconductor regions of a first conductivity type are positioned between the first electrode and the second electrode and contact the first electrode. These semiconductor regions are arranged along a first direction. A second semiconductor region of the first conductivity type also contacts the first electrode and is disposed around the plurality of first semiconductor regions. The second semiconductor region has a dopant concentration that is higher than the first semiconductor regions. A semiconductor layer of a second conductivity type has portions that are between the first semiconductor regions and the second semiconductor region. These portions are in Schottky contact with the first electrode.
申请公布号 US2015035111(A1) 申请公布日期 2015.02.05
申请号 US201414186694 申请日期 2014.02.21
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OTA Tsuyoshi;HORI Yoichi;NODA Takao
分类号 H01L29/872 主分类号 H01L29/872
代理机构 代理人
主权项 1. A semiconductor device, comprising: a first electrode; a second electrode; multiple first conductivity-type first semiconductor regions that are positioned between the first electrode and the second electrode, are in contact with the first electrode, and are arranged along a first direction intersecting a second direction that extends from the first electrode toward the second electrode; a first conductivity-type second semiconductor region that is in contact with the first electrode, disposed around the multiple first conductivity-type first semiconductor regions, and has a dopant concentration that is higher than a dopant concentration of the multiple first conductivity-type first semiconductor regions; and a second conductivity-type first semiconductor layer having portions that are between the multiple first conductivity-type first semiconductor regions and the first conductivity-type second semiconductor region and in Schottky contact with the first electrode.
地址 Tokyo JP