发明名称 |
PRODUCTION METHOD OF PATTERNED RETARDATION FILM |
摘要 |
PROBLEM TO BE SOLVED: To reduce alignment failures caused by offset of a fluorine-based or silicone-based leveling agent included in a clear antireflection layer, in a patterned retardation film having the clear antireflection layer.SOLUTION: A production method of a patterned retardation film is provided, which includes: an antireflection layer formation step of forming a clear antireflection layer containing a fluorine-based or silicone-based leveling agent and showing a haze value of 0.5% or less specified by JISK7105, on one surface of a transparent substrate; an alignment layer formation step of forming an alignment layer on the other surface of the transparent substrate; and a retardation layer formation step of forming a retardation layer on the alignment layer. The method also includes a step of winding the laminate after at least the antireflection layer formation step into a wound body of a long film. The alignment layer formation step is carried out after the long film is drawn from the wound body and subjected to a corona treatment or a plasma treatment on the other surface of the transparent substrate. |
申请公布号 |
JP2015025969(A) |
申请公布日期 |
2015.02.05 |
申请号 |
JP20130155874 |
申请日期 |
2013.07.26 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
INOMATA HIROYA;YOSHIDA RYOHEI;NISHIMURA MASATOSHI;HAYASHI YUSUKE |
分类号 |
G02B5/30;B32B7/02;G02B1/11;G02F1/13363;G02F1/1337 |
主分类号 |
G02B5/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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