| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a thin film capable of covering the whole area of a region to be applied on a substrate surface with a thin film material even if the substrate surface has liquid repellency.SOLUTION: A first film is formed in a region where a thin film material is to be applied on a surface having liquid repellency, by repeating a process of impacting a photocurable thin film material on the surface and a process of curing the thin film material on the surface after impacting by irradiating the thin film material with light, while moving an impact point. A second film in a liquid state is formed by applying a liquid thin film material on the first film. After the second film is formed, the second film is cured by irradiating the second film with light. |
