| 摘要 |
PROBLEM TO BE SOLVED: To provide a proximity exposure device and a proximity exposure method capable of obtaining a good light exposure accuracy even in a case where deviation occurs between a position of a chip and a position of a pattern of a mask at light exposure.SOLUTION: A proximity exposure device 10 comprises: an alignment camera measuring position deviation between an opening of a pattern of a mask M and an exposed material at a plurality of positions; and a reflection mirror adjustment mechanism having a plurality of supporting mechanisms respectively supporting a peripheral edge part or a rear face of a planar mirror 38, and a plurality of motors 75 that can move the plurality of supporting mechanisms respectively, and the reflection mirror adjustment mechanism partially and elastically deforming the planar mirror 38. The plurality of motors 75 are moved respectively on the basis of the position deviation measured at the plurality of positions, so that the planar mirror 38 is partially and elastically deformed, and an optical axis of exposure light is adjusted so as to correct the position deviation. |
