PLASMA FILM DEPOSITION DEVICE AND PLASMA FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a technique for securely conveying an object to be processed from a dehydrating process part to a film depositing process part.SOLUTION: A plasma film deposition device 1 includes: a film depositing process part 2; a dehydrating process part 3; a conveyance mechanism 4 which holds a work W and conveys the work W between the film depositing process part 2 and the dehydrating process part 3 through a conveyance communication port 30 formed between the film depositing process part 2 and the dehydrating process part 3; a gate valve 5 which opens and closes the conveyance communication port 30 by partitioning off a communication space 40 as a space in the conveyance communication port 30; and a control part 6 which controls the conveyance mechanism 4. The communication space 40 is so formed as to spread from the dehydrating process part 3 to the film depositing process part 2. The communication space 40 has a dehydration-side communication space 50 located on the side of the dehydrating process part 3 when partitioned off by the gate valve 5. The control part 6 controls the conveyance mechanism 4 so that when the dehydrating process part 3 performs a dehydrating process on the work W, a lower end W1 of the work W is positioned in the dehydration-side communication space 50.