发明名称 INDUCTIVE DEVICE THAT INCLUDES CONDUCTIVE VIA AND METAL LAYER
摘要 <p>An inductive device that includes a conductive via and a metal layer are disclosed. A particular method of forming an electronic device includes forming a metal layer that contacts a surface of a substrate. The substrate, including the surface, is formed from a substantially uniform dielectric material. The metal layer contacts a conductive via that extends at least partially within the substrate. The metal layer and the conductive via form at least a portion of an inductive device.</p>
申请公布号 WO2015017153(A1) 申请公布日期 2015.02.05
申请号 WO2014US47423 申请日期 2014.07.21
申请人 QUALCOMM INCORPORATED 发明人 LAN, JE-HSIUNG;ZUO, CHENGJIE;VELEZ, MARIO FRANCISCO;KIM, DAEIK D.;BERDY, DAVID F.;YUN, CHANGHAN;MIKULKA, ROBERT P.;KIM, JONGHAE;NOWAK, MATTHEW M.
分类号 H01F41/04;H01L23/498;H01L23/64;H05K1/16 主分类号 H01F41/04
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