发明名称 LIQUID ATOMIZATION DEVICE
摘要 A liquid atomization device includes a first gas spray unit and a second gas spray unit; a liquid outflow unit for flowing out liquid; a gas-liquid mixing area where a gas flow sprayed from the first gas spray unit, a gas flow sprayed from the second gas spray unit, and liquid which flows out from the liquid outflow unit are made to collide against each other to atomize the liquid; a projection formed to project out of the device such that its cross section projects in a convex manner, the gas-liquid mixing area being formed in the projection; a spray slit formed in the projection along a wide angle spray direction of mist produced by the gas-liquid mixing area; and a restriction portion formed near a bottom of the spray slit such that the restriction portion inclines in the wide angle spray direction of the mist.
申请公布号 US2015035179(A1) 申请公布日期 2015.02.05
申请号 US201214355823 申请日期 2012.10.19
申请人 Nozzle Network Co., Ltd. 发明人 Asakawa Hiroyoshi;Kuge Ryota
分类号 B01F3/04;B05B7/00;B01F5/04 主分类号 B01F3/04
代理机构 代理人
主权项 1. A liquid atomization device comprising: a first gas spray unit and a second gas spray unit for causing two gas flows collide against each other; a liquid outflow unit for flowing out liquid; a gas-liquid mixing area where a gas flow sprayed from the first gas spray unit, a gas flow sprayed from the second gas spray unit, and liquid which flows out from the liquid outflow unit are made to collide against each other to atomize the liquid; a projection formed to project out of the device such that its cross section projects in a convex manner, the gas-liquid mixing area being formed in the projection; a spray slit formed in the projection along a wide angle spray direction of mist produced by the gas-liquid mixing area; and a restriction portion formed near a bottom of the spray slit such that the restriction portion inclines in the wide angle spray direction of the mist.
地址 Tamba-shi, Hyogo JP