发明名称 |
LIQUID ATOMIZATION DEVICE |
摘要 |
A liquid atomization device includes a first gas spray unit and a second gas spray unit; a liquid outflow unit for flowing out liquid; a gas-liquid mixing area where a gas flow sprayed from the first gas spray unit, a gas flow sprayed from the second gas spray unit, and liquid which flows out from the liquid outflow unit are made to collide against each other to atomize the liquid; a projection formed to project out of the device such that its cross section projects in a convex manner, the gas-liquid mixing area being formed in the projection; a spray slit formed in the projection along a wide angle spray direction of mist produced by the gas-liquid mixing area; and a restriction portion formed near a bottom of the spray slit such that the restriction portion inclines in the wide angle spray direction of the mist. |
申请公布号 |
US2015035179(A1) |
申请公布日期 |
2015.02.05 |
申请号 |
US201214355823 |
申请日期 |
2012.10.19 |
申请人 |
Nozzle Network Co., Ltd. |
发明人 |
Asakawa Hiroyoshi;Kuge Ryota |
分类号 |
B01F3/04;B05B7/00;B01F5/04 |
主分类号 |
B01F3/04 |
代理机构 |
|
代理人 |
|
主权项 |
1. A liquid atomization device comprising:
a first gas spray unit and a second gas spray unit for causing two gas flows collide against each other; a liquid outflow unit for flowing out liquid; a gas-liquid mixing area where a gas flow sprayed from the first gas spray unit, a gas flow sprayed from the second gas spray unit, and liquid which flows out from the liquid outflow unit are made to collide against each other to atomize the liquid; a projection formed to project out of the device such that its cross section projects in a convex manner, the gas-liquid mixing area being formed in the projection; a spray slit formed in the projection along a wide angle spray direction of mist produced by the gas-liquid mixing area; and a restriction portion formed near a bottom of the spray slit such that the restriction portion inclines in the wide angle spray direction of the mist. |
地址 |
Tamba-shi, Hyogo JP |