发明名称 METHOD OF MONITORING A LASER BEAM AND LASER IRRADIATION APPARATUS USING THE SAME
摘要 A laser irradiation apparatus is provided. The laser irradiation apparatus includes a laser beam generator configured to generate laser beams; a slit unit configured to selectively transmit the laser beams; a mirror unit configured to change a path of the selectively transmitted laser beams, so as to irradiate the selectively transmitted laser beams onto a processing target; a first optical system, wherein a first portion of the selectively transmitted laser beams penetrates through the mirror unit and is projected to the first optical system; and a second optical system, wherein a second portion of the selectively transmitted laser beams penetrates through the mirror unit and is projected to the second optical system.
申请公布号 US2015034614(A1) 申请公布日期 2015.02.05
申请号 US201414170350 申请日期 2014.01.31
申请人 Samsung Display Co., Ltd. 发明人 KIM Joon-Hyung;LEE Hae-Sook;KIM Sung-Gon;JEONG IL-Young;HAN Gyoo-Wan;RYU Je-Kil;CHO Kyoung-Seok
分类号 H01L21/66;B23K26/03;B23K26/00 主分类号 H01L21/66
代理机构 代理人
主权项 1. A laser irradiation apparatus comprising: a laser beam generator configured to generate laser beams; a slit unit configured to selectively transmit the laser beams; a mirror unit configured to change a path of the selectively transmitted laser beams, so as to irradiate the selectively transmitted laser beams onto a processing target; a first optical system, wherein a first portion of the selectively transmitted laser beams penetrates through the mirror unit and is projected to the first optical system; and a second optical system, wherein a second portion of the selectively transmitted laser beams penetrates through the mirror unit and is projected to the second optical system.
地址 Yongin-City KR
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