发明名称 EXPOSURE CONTROL APPARATUS AND METHOD, STORAGE MEDIUM, AND IMAGE PICKUP APPARATUS
摘要 An exposure control apparatus which is capable of making a backlight judgment with accuracy using image data on a main subject and image data on a photographer and controlling exposure according to the judgment result. First image data is generated according to a main subject image formed by light from the main subject via a first shooting optical system, and second image data is generated according to a photographer image formed by light from a photographer via a second shooting optical system. First luminance information is obtained based on the first image data, and second luminance information is obtained based on the second image data. According to the first luminance information and the second luminance information, whether or not the main subject is in backlight scene is judged, and based on a result of the judgment, exposure for the main subject is controlled.
申请公布号 US2015036040(A1) 申请公布日期 2015.02.05
申请号 US201414445943 申请日期 2014.07.29
申请人 CANON KABUSHIKI KAISHA 发明人 Konishi Kazuki
分类号 H04N5/235 主分类号 H04N5/235
代理机构 代理人
主权项 1. An exposure control apparatus of an image pickup apparatus having a first image pickup unit configured to generate first image data according to a main subject image formed by light from a main subject via a first shooting optical system, and a second image pickup unit configured to generate second image data according to a photographer image formed by light from a photographer via a second shooting optical system, comprising: a first photometric measurement unit configured to obtain first luminance information based on the first image data; a second photometric measurement unit configured to obtain second luminance information based on the second image data; a judgment unit configured to judge, according to the first luminance information and the second luminance information, whether or not the main subject is in backlight scene; and an exposure control unit configured to control, based on a result of the judgment by said judgment unit, exposure for the main subject.
地址 Tokyo JP