| 摘要 |
PROBLEM TO BE SOLVED: To provide a power supply device for an electron beam generation device that enables adjustment to an appropriate drive frequency in accordance with an application width of an output current of the electron beam generation device.SOLUTION: A high voltage unit 11 generates a DC high voltage as an acceleration voltage of an electron gun 14 of an electron beam lithography device. A control unit 12 controls an output voltage of the high voltage unit 11 to become constant and controls an output current of the electron gun 14 to assume a current set value set at a current setter 15. A frequency setting unit 13 has a digital potentiometer 24 interlocked with the current set value of the current setter 15 and sets, on the basis of a set position of the digital potentiometer 24, a drive frequency of the control unit 12 so that it becomes a prescribed frequency. |
