发明名称 |
SEMICONDUCTING GRAPHENE STRUCTURES, METHODS OF FORMING SUCH STRUCTURES AND SEMICONDUCTOR DEVICES INCLUDING SUCH STRUCTURES |
摘要 |
A semiconducting graphene structure may include a graphene material and a graphene lattice matching material over at least a portion of the graphene material, wherein the graphene lattice matching material has a lattice constant within about 5% of a multiple of the lattice constant or bond length of the graphene material. The semiconducting graphene structure may have an energy band gap of at least about 0.5 eV. A method of modifying an energy band gap of a graphene material may include forming a graphene lattice matching material over at least a portion of a graphene material, the graphene lattice matching material having a lattice constant within about 5% of a multiple of the lattice constant or bond length of the graphene material. |
申请公布号 |
WO2015017117(A1) |
申请公布日期 |
2015.02.05 |
申请号 |
WO2014US46611 |
申请日期 |
2014.07.15 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
MEADE, ROY E.;PANDEY, SUMEET C. |
分类号 |
C01B31/04 |
主分类号 |
C01B31/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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