发明名称 SEMICONDUCTING GRAPHENE STRUCTURES, METHODS OF FORMING SUCH STRUCTURES AND SEMICONDUCTOR DEVICES INCLUDING SUCH STRUCTURES
摘要 A semiconducting graphene structure may include a graphene material and a graphene lattice matching material over at least a portion of the graphene material, wherein the graphene lattice matching material has a lattice constant within about 5% of a multiple of the lattice constant or bond length of the graphene material. The semiconducting graphene structure may have an energy band gap of at least about 0.5 eV. A method of modifying an energy band gap of a graphene material may include forming a graphene lattice matching material over at least a portion of a graphene material, the graphene lattice matching material having a lattice constant within about 5% of a multiple of the lattice constant or bond length of the graphene material.
申请公布号 WO2015017117(A1) 申请公布日期 2015.02.05
申请号 WO2014US46611 申请日期 2014.07.15
申请人 MICRON TECHNOLOGY, INC. 发明人 MEADE, ROY E.;PANDEY, SUMEET C.
分类号 C01B31/04 主分类号 C01B31/04
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