| 摘要 |
Provided are a laser processing apparatus capable of measuring a first focus position of an object to be processed by using a processing laser without a separate laser device for focus measurement, and a laser processing method using the same. The laser processing apparatus comprises a laser light source, a beam splitter, a first light focusing unit, and a beam profiler. The beam splitter splits a laser beam emitted from the laser light source into a reflected beam and a transmitted beam, and the first light focusing unit causes the transmitted beam to be focused on the object to be processed. The beam profiler receives the laser beam reflected by the object to be processed and passing through the first light focusing unit and the beam splitter, and measures the profile changes of the laser beam according to a change in position of the object to be processed. |
