| 摘要 |
<p>Disclosed is a substrate treating apparatus. The substrate treating apparatus may include: a substrate support member which maintains a substrate; a storage member which is supported by the substrate support member and supplies a chemical solution to the substrate; a chemical solution supplying member which supplies the chemical solution stored in the storage member to the substrate supported by the substrate support member; and a reflux member which prevents concentration change due to the vaporization phenomenon of the chemical solution stored in the storage member.</p> |
