| 摘要 |
<p>The present invention relates to a vapor deposition apparatus. According to an embodiment of the present invention, the vapor deposition apparatus forms a deposition layer on a substrate and comprises: a plurality of first nozzle portions spraying a first source material in the direction of the substrate; a plurality of second nozzle portions arranged alternately with the first nozzle portions, spraying a second source material in the direction of the substrate; a diffuser portion distributing the second source material to the second nozzle portions; and a supply portion supplying the second source material to the diffuser portion. Therefore, the present invention easily improves properties of the formed deposition layer and facilitates maintenance of the vapor deposition apparatus.</p> |
