| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a stage device provided with a mark stand capable of adjusting a focus of an electron beam or deflection sensitivity by using a mark at the height actually same as the height of a sample surface such as a mask, and an electron beam drawing device using the stage device. <P>SOLUTION: A stage device comprises: an XY stage which can move in a direction orthogonal to an optical axis of an electron beam; a mark stand for adjusting the electron beam which is fixed on the XY stage; and a Z stage which is mounted on the XY stage while avoiding an area in which the mark stand is fixed, and can move in the optical axis direction, and on which a sample is placed. On the mark stand, reference chips 114 and 115 provided with a plurality of marks 4a<SB POS="POST">1</SB>, 4a<SB POS="POST">2</SB>, 4a<SB POS="POST">3</SB>, 4b<SB POS="POST">1</SB>, 4b<SB POS="POST">2</SB>, and 4b<SB POS="POST">3</SB>having different surface height are disposed. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
