| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus which discharges a solution layer after immersing a substrate in the solution layer to perform the liquid processing. <P>SOLUTION: A liquid processing apparatus includes: a substrate support part for supporting a substrate; a storage tank provided below the substrate supporting part; and an annular cup part which is provided at the outer peripheral side of the storage tank so as to enclose the storage tank. The storage tank includes: a circular bottom part provided so as to face a lower surface of the substrate which is supported by the substrate support part and a dam part including a peripheral wall provided at an outer peripheral part of the bottom part so as to enclose the bottom part. The liquid processing apparatus changes a relative position relation between the bottom part and the dam part thereby storing a liquid in the storage tank or discharging the liquid of the storage tank. The cup part houses the discharged liquid. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
