发明名称 |
PROCESS FOR PRODUCING TWO-DIMENSIONAL NANOMATERIALS |
摘要 |
The present invention provides a process for producing a two-dimensional nanomaterial by chemical vapour deposition (CVD), the process comprising contacting a substrate in a reaction chamber with a first flow which contains hydrogen and a second flow which contains a precursor for said material, wherein the contacting takes place under conditions such that the precursor reacts in the chamber to form said material on a surface of the substrate, wherein the ratio of the flow rate of the first flow to the flow rate of the second flow is at least 5:1. Two-dimensional nanomaterials obtainable by said process are also provided, as well as devices comprising said nanomaterials. |
申请公布号 |
EP2831315(A1) |
申请公布日期 |
2015.02.04 |
申请号 |
EP20130714993 |
申请日期 |
2013.03.28 |
申请人 |
ISIS INNOVATION LIMITED |
发明人 |
GROBERT, NICOLE;MURDOCK, ADRIAN TIMOTHY;KOÓS, ANTAL ADOLF |
分类号 |
C30B25/16;B82Y30/00;B82Y40/00;C01B31/04;C23C16/26;C30B25/18;C30B29/02 |
主分类号 |
C30B25/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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