| 摘要 |
The present invention provides a slim etching method for a glass substrate. The slim etching method includes a pretreatment process of spraying a pretreatment solution including 65-75 wt% of sulfuric acid and 0.75-1.5 wt% of hydrofluoric acid downward toward a plurality of glass substrates separated from each other; an etching process of spraying an etching solution including 1-20 wt% of at least one from hydrofluoric acid and ammonium difluoride downward. According to the slim etching method of the present invention, when defect growth on the glass substrate is prevented by using a mixture solution of high density sulfuric acid and low density hydrofluoric acid, bumpy curvature, generated by pretreating a glass substrate in a prior dipping method, is significantly reduced; the sized of the curvature is also reduced; and thus strains on the glass substrate are reduced. Therefore, the glass substrate, which is slim and has excellent optical properties, can be manufactured. |
