| 摘要 |
<p>The present invention relates to a deposition film forming apparatus including rotating member in which the rotation of substrates may be controlled by rotating members included in each of a plurality of substrate supports. According to an embodiment of the present invention, provided is the deposition film forming apparatus which includes a plurality of substrate supports, wherein a plurality of substrates are disposed on each of the substrate supports, and each of the substrates is rotated on the substrate supports by means of a gas-foil method.</p> |
