发明名称 処理装置、座標補正方法および座標補正プログラム
摘要 <p>The invention provides a processing apparatus which can automatically correct the deviation between a coordinate registered during correction and an actual coordinate while reducing the situation of low production efficiency, and a processing system and a coordinate correction method. A substrate inspecting/measuring device (10) determines the actual coordinate of a model in a substrate (W) disposed on a conveying stage (13) and registers the determined actual coordinate in a process (Step 114). The substrate inspecting/measuring device (10) conducts inspection/measurement on the model in the substrate (W) disposed on the conveying stage (13) based on the process storing the inspection/measurement coordinate of the model in the substrate (W).</p>
申请公布号 JP5663192(B2) 申请公布日期 2015.02.04
申请号 JP20100105475 申请日期 2010.04.30
申请人 发明人
分类号 G01N21/956;G01B11/00;H01L21/027 主分类号 G01N21/956
代理机构 代理人
主权项
地址
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