| 摘要 |
<p>Provided in the present invention are a method for measuring the thickness of an object to be measured which can measure the thickness of a film by using a spectrum representing optical properties of reflected light, and an apparatus therefor. The thickness measuring method comprises the steps of: acquiring a wavelength domain spectrum with regard to an amplitude ratio (Ψ) or phase difference (Δ) of the reflected light reflected from the film by irradiating incident light to the film; converting the wavelength domain spectrum into a 1/wavelength domain spectrum; acquiring a result spectrum by executing fast Fourier transform (FFT) on the 1/wavelength domain spectrum; and measuring the thickness of the film from the result spectrum.</p> |
