发明名称 HOLDING APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <p>A holding apparatus is provided with a holding member that has a holding surface that holds a substrate on which a pattern is to be formed, a plurality of first electrode members that are provided on the holding member and that generate electrostatic force in accordance with supplied voltage in order to attract the substrate to the holding surface, and a power supply device that is able to supply voltage to the first electrode members. The first electrode members are positioned in accordance with pattern information.</p>
申请公布号 KR101489521(B1) 申请公布日期 2015.02.03
申请号 KR20097018292 申请日期 2008.03.19
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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