发明名称 Substrate processing system, substrate processing apparatus and display method of substrate processing apparatus
摘要 Provided are a substrate processing apparatus, a display method thereof, and a substrate processing system capable of detecting any change in the condition of each component of a substrate processing apparatus. In the substrate processing system including the substrate processing apparatus for processing a substrate and a group management apparatus connected thereto, the substrate processing apparatus is configured to acquire monitor data representing at least the condition of each component of the substrate processing apparatus, aggregate a plurality of the monitor data to generate package data including at least one of a maximum value, an average value, and a minimum value of the monitor data, and transmit the package data to the group management apparatus. The group management apparatus is configured to receive the package data from the substrate processing apparatus and readably store the same therein.
申请公布号 US8948899(B2) 申请公布日期 2015.02.03
申请号 US201113211105 申请日期 2011.08.16
申请人 Hitachi Kokusai Electric Inc. 发明人 Asai Kazuhide
分类号 G06F19/00;G01R31/26;G05B23/02 主分类号 G06F19/00
代理机构 Volpe and Koenig, P.C. 代理人 Volpe and Koenig, P.C.
主权项 1. A substrate processing apparatus configured to generate package data including a maximum value, an average value, and a minimum value of monitor data associated with a condition of each component of the substrate processing apparatus in predetermined cycles, wherein the substrate processing apparatus acquires the monitor data representing at least the condition of each component of the substrate processing apparatus, updates the package data based on the monitor data acquired in each of the predetermined cycles, and stores the package data.
地址 Tokyo JP