Flare-measuring mask, flare-measuring method, and exposure method

摘要

A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends of the second side; projecting an image of the sectoral pattern via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern and a light amount provided at a position away from the image. With the flare measuring method, it is possible to correctly measure the flare information in an arbitrary angle range of the sectoral pattern.

主权项

1. A flare-measuring method for measuring flare information of a projection optical system, the flare-measuring method comprising:
arranging at least one aperture pattern of a mask at an object plane of the projection optical system, each aperture pattern of the at least one aperture pattern having a first straight line portion, a second straight line portion that is inclined at a predetermined angle with respect to the first straight line portion, and a first connecting line portion that connects one end of the first straight line portion and one end of the second straight line portion; irradiating an exposure light onto the at least one aperture pattern and forming an image of the at least one aperture pattern from the mask via the projection optical system onto a photosensitive substrate at an image plane of the projection optical system; and measuring flare information based on a ratio of (1) a first light amount of the exposure light irradiated onto the at least one aperture pattern to (2) a second light amount of the image of the at least one aperture pattern provided via the projection optical system, wherein the at least one aperture pattern is defined by the first straight line portion, the second straight line portion and the first connecting line portion, and the arranging of the at least one aperture pattern comprises arranging a plurality of pairs of the aperture patterns in a scanning direction of the projection optical system, the plurality of pairs of the aperture patterns being oriented in mutually different rotation directions about a point of intersection of a first straight line obtained by extending the first straight line portion and a second straight line obtained by extending the second straight line portion.