| 摘要 |
<p>A substrate processing apparatus is provided to stably support a substrate without respect to a size of the substrate. A substrate processing apparatus comprises a support plate, an electrostatic member(28) and an absorption member(24). A substrate is placed in the support plate. The electrostatic member is installed on the support plate. The electrostatic member performs electrostatic absorption of a substrate placed on the support plate. The absorption member performs vacuum suction of the substrate placed on the support plate.</p> |
