发明名称 |
SOI lateral bipolar transistor having multi-sided base contact and methods for making same |
摘要 |
A Bipolar Junction Transistor with an intrinsic base, wherein the intrinsic base includes a top surface and two side walls orthogonal to the top surface, and a base contact electrically coupled to the side walls of the intrinsic base. In one embodiment an apparatus can include a plurality of Bipolar Junction Transistors, and a base contact electrically coupled to the side walls of the intrinsic bases of each BJT. |
申请公布号 |
US8946040(B2) |
申请公布日期 |
2015.02.03 |
申请号 |
US201213343688 |
申请日期 |
2012.01.04 |
申请人 |
International Business Machines Corporation |
发明人 |
Cai Jin;Ning Tak H. |
分类号 |
H01L21/331;H01L21/8249;H01L29/10 |
主分类号 |
H01L21/331 |
代理机构 |
|
代理人 |
Tuchman Ido;Percello Louis J. |
主权项 |
1. A method for fabricating a bipolar junction transistor (BJT) with a small base resistance on a substrate with a semiconductor layer, the method comprising:
patterning an active semiconductor region on the semiconductor layer, the active semiconductor region including an intrinsic base of the BJT, the intrinsic base including a top surface and two side walls substantially orthogonal to the top surface; forming a base contact that is electrically coupled to the side walls of the intrinsic base; forming a sacrificial gate over the intrinsic base before forming the base contact; forming a dielectric spacer about the sacrificial gate; selectively etching the sacrificial gate over the intrinsic base to create a channel, the top surface and the side walls of the intrinsic base being exposed at the channel; and wherein forming the base contact includes filling the channel with a base contact material. |
地址 |
Armonk NY US |