发明名称 SOI lateral bipolar transistor having multi-sided base contact and methods for making same
摘要 A Bipolar Junction Transistor with an intrinsic base, wherein the intrinsic base includes a top surface and two side walls orthogonal to the top surface, and a base contact electrically coupled to the side walls of the intrinsic base. In one embodiment an apparatus can include a plurality of Bipolar Junction Transistors, and a base contact electrically coupled to the side walls of the intrinsic bases of each BJT.
申请公布号 US8946040(B2) 申请公布日期 2015.02.03
申请号 US201213343688 申请日期 2012.01.04
申请人 International Business Machines Corporation 发明人 Cai Jin;Ning Tak H.
分类号 H01L21/331;H01L21/8249;H01L29/10 主分类号 H01L21/331
代理机构 代理人 Tuchman Ido;Percello Louis J.
主权项 1. A method for fabricating a bipolar junction transistor (BJT) with a small base resistance on a substrate with a semiconductor layer, the method comprising: patterning an active semiconductor region on the semiconductor layer, the active semiconductor region including an intrinsic base of the BJT, the intrinsic base including a top surface and two side walls substantially orthogonal to the top surface; forming a base contact that is electrically coupled to the side walls of the intrinsic base; forming a sacrificial gate over the intrinsic base before forming the base contact; forming a dielectric spacer about the sacrificial gate; selectively etching the sacrificial gate over the intrinsic base to create a channel, the top surface and the side walls of the intrinsic base being exposed at the channel; and wherein forming the base contact includes filling the channel with a base contact material.
地址 Armonk NY US