发明名称 Semiconductor devices and methods of fabricating the same
摘要 A semiconductor device includes a plurality of first insulating layers and a plurality of second layers alternately and vertically stacked on a substrate. Each of the plurality of second layers includes a horizontal electrode horizontally separated by a second insulating layer. A contact plug penetrates the plurality of first insulating layers and the second insulating layer of the plurality of second layers.
申请公布号 US8946665(B2) 申请公布日期 2015.02.03
申请号 US201313938833 申请日期 2013.07.10
申请人 Samsung Electronics Co., Ltd. 发明人 Shim Sunil;Cho Wonseok;Lee Woonkyung
分类号 H01L29/78;H01L21/28;H01L29/792;H01L21/8239;H01L27/11;H01L27/115;H01L23/538;H01L27/24;H01L45/00 主分类号 H01L29/78
代理机构 F. Chau & Associates, LLC 代理人 F. Chau & Associates, LLC
主权项 1. A semiconductor device, comprising: a plurality of horizontal electrodes vertically stacked on a substrate; a plurality of first insulating layers, each of which is disposed between a corresponding pair of the plurality of horizontal electrodes; a plurality of second insulating layers, each of which is disposed between a corresponding pair of the plurality of first insulating layers and is disposed at the same vertical level as a corresponding one of the plurality of horizontal electrodes; and a contact structure penetrating the first and second insulating layers, wherein the contact structure is in contact with the first insulating layers and the second insulating layers.
地址 Suwon-si, Gyeonggi-do KR