发明名称 |
Semiconductor devices and methods of fabricating the same |
摘要 |
A semiconductor device includes a plurality of first insulating layers and a plurality of second layers alternately and vertically stacked on a substrate. Each of the plurality of second layers includes a horizontal electrode horizontally separated by a second insulating layer. A contact plug penetrates the plurality of first insulating layers and the second insulating layer of the plurality of second layers. |
申请公布号 |
US8946665(B2) |
申请公布日期 |
2015.02.03 |
申请号 |
US201313938833 |
申请日期 |
2013.07.10 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Shim Sunil;Cho Wonseok;Lee Woonkyung |
分类号 |
H01L29/78;H01L21/28;H01L29/792;H01L21/8239;H01L27/11;H01L27/115;H01L23/538;H01L27/24;H01L45/00 |
主分类号 |
H01L29/78 |
代理机构 |
F. Chau & Associates, LLC |
代理人 |
F. Chau & Associates, LLC |
主权项 |
1. A semiconductor device, comprising:
a plurality of horizontal electrodes vertically stacked on a substrate; a plurality of first insulating layers, each of which is disposed between a corresponding pair of the plurality of horizontal electrodes; a plurality of second insulating layers, each of which is disposed between a corresponding pair of the plurality of first insulating layers and is disposed at the same vertical level as a corresponding one of the plurality of horizontal electrodes; and a contact structure penetrating the first and second insulating layers, wherein the contact structure is in contact with the first insulating layers and the second insulating layers. |
地址 |
Suwon-si, Gyeonggi-do KR |