| 主权项 |
1. A resist composition comprising:
a) a photoresist polymer that does not comprise a silsesquioxane polymer; b) at least one photoacid generator; c) a solvent; and d) a resist additive compound including a polymer, oligomer or cage structure having the following structure A:wherein,
each Z1, Z2, and Z3 independently represents a member selected from the group consisting of linear, branched, or cyclic alkylene, and linear, branched or cyclic heteroalkylene; n1, n2 and n3 independently represent the number of repeat units of each type in the polymer, oligomer, or cage structure; and n1+n2+n3≧2; X1, X, and X3 independently represents a member selected from the group consisting of linear, branched, or cyclic alkylene, linear, branched or cyclic heteroalkylene, carboxyl, and carbonyl; R1 is a moiety containing a fluoroalcohol group that is unprotected or partially or fully protected with an acid-labile group; and R2 is selected from H, or a moiety containing carboxylic acid, sulfonamide, fluoroalcohol, or sulfonic acid, that is unprotected or partially or fully protected with an acid-labile group; and R3 is a nonfluorinated or partially fluorinated or perfluorinated functionality, other than a fluorinated ether, that is acid-labile or non-acid labile, wherein the functionality does not comprise an unsaturated hydrocarbon group;provided thatthe resist additive compound contains a fluorocarbyl moiety other than a fluorinated ether;if Z1, Z2 and/or Z3 isthen X1 and R1 together, X2 and R2 together, and/or X3 and R3 together can represent hydrogen;if Z1, Z2 and/or Z3 isand X1, X2 and/or X3 is alkylene, then R1, R2 and R3 are not —C(CF3)2—OH;if X1, X2 and/or X3 is carboxyl, then R1, R2 and R3 are not norbornyl substituted by —CH2—C(CF3)2—OH; and
If Z1, Z2 and/or Z3 is linear alkylene, and X1, X2 and/or X3 is methylene, then R1, R2 and R3 are not —C(CF3)2—OH;and provided that the compound does not comprise a structure selected from the group consisting of: |
