Method of metal deposition

摘要

A method of forming a metal layer on an electrically insulating substrate comprises depositing a photocatalyst layer onto the substrate and depositing a mask layer comprising voids on the substrate, such as a layer of latex microparticles with voids between them, to give an open pore structure to the mask. An electroless plating solution is then provided on the photocatalyst layer, and the photocatalyst layer and electroless plating solution are illuminated with actinic radiation whereby deposition of metal from the electroless plating solution to form a metal layer on the photocatalyst layer is initiated whereby the metal deposits in the voids of the mask layer. The mask layer is subsequently removed to leave a porous metal layer on the substrate. The method allows for deposition of porous metal films with controlled thickness and excellent adhesion onto electrically insulating substrates. The method is suitable for providing metal layers with controlled, regular porosity.

主权项

1. A method of forming a porous metal layer on an electrically insulating substrate, the method comprising:
a) depositing a photocatalyst layer onto the substrate, b) depositing a mask layer comprising voids, on the photocatalyst layer, wherein the mask layer is a layer of microparticles in an ordered, close-packed arrangement, the voids being the spaces between the microparticles, c) providing an electroless plating solution on the mask layer and photocatalyst layer, d) illuminating the photocatalyst layer, mask layer and electroless plating solution with actinic radiation whereby deposition of metal from the electroless plating solution to form a metal layer on the photocatalyst layer is initiated, whereby deposition of the metal occurs within the voids, and e) removing the mask layer following deposition of the metal to provide a porous metal layer.