发明名称 |
Phase-change memory device using Sb-Se metal alloy and method of fabricating the same |
摘要 |
Provided are a phase-change memory device using a phase-change material having a low melting point and a high crystallization speed, and a method of fabricating the same. The phase-change memory device includes an antimony (Sb)-selenium (Se) chalcogenide SbxSe100-x phase-change material layer contacting a heat-generating electrode layer exposed through a pore and filling the pore. Due to the use of SbxSe100-x in the phase-change material layer, a higher-speed, lower-power consumption phase-change memory device than a GST memory device can be manufactured. |
申请公布号 |
USRE45356(E1) |
申请公布日期 |
2015.02.03 |
申请号 |
US201113161932 |
申请日期 |
2011.06.16 |
申请人 |
Electronics and Telecommunications Research Institute |
发明人 |
Yoon Sung Min;Lee Nam Yeal;Ryu Sang Ouk;Lee Seung Yun;Park Young Sam;Choi Kyu Jeong;Yu Byoung Gon |
分类号 |
H01L29/08 |
主分类号 |
H01L29/08 |
代理机构 |
NSIP Law |
代理人 |
NSIP Law |
主权项 |
1. A phase-change memory device comprising:
a heat-generating electrode layer; and a first insulating layer partially covering the heat-generating electrode layer, exposing a portion of the heat-generating electrode layer, and having a pore therein; and an antimony (Sb)-selenium (Se) chalcogenide SbxSe100-x phase-change material layer contacting the portion of the heat-generating electrode layer exposed through the pore, and filling the pore, wherein the content (x) of antimony (Sb) in the SbxSe100-x phase-change material layer is in the range of 40 to 59. |
地址 |
Daejeon KR |