| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a charged particle multi-beam apparatus increasing the number of programmable beams without increasing the amount of data to be processed within one deflection array device.SOLUTION: A pattern definition (PD) device 500 includes at least two deflection array devices 512, 522 positioned in a stacked arrangement, and a particle beam Ib is deflected or blanked. Each of the deflection array device 512, 522 includes a plurality of blanking openings 513, 523 and a plurality of deflecting devices, each of which is associated with a respective blanking opening 513, 523 and includes at least one electrostatic electrode 510, 511, 520, 521. The deflecting devices are selectively activatable, correspond to respective subsets A, B of beamlets, and act on only a beamlet belonging to respective subsets A, B by selectively deflecting them, while allowing the other beamlets B, A not to deflect.</p> |
