| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus and a substrate cleaning method that efficiently remove a contaminant such as a particle attached to a substrate surface.SOLUTION: A substrate cleaning apparatus 1 includes a macromolecule supply unit 3 that supplies a macromolecule having polarity to be attached to a substrate 9 and a contaminant, and a physical cleaning unit 4 that performs non-contact physical cleaning of the substrate 9 to which the macromolecule is attached. The contaminant is adsorbed to the substrate 9 by Van der Waals force or the like. The charged macromolecule is attached to the substrate 9 and the contaminant to allow both of the substrate 9 and the contaminant to be charged to the same polarity, thereby reducing adhesive force between the substrate 9 and the contaminant due to electrostatic repulsive force. Physical cleaning is performed while the adhesive force between the substrate 9 and the contaminant is reduced, thereby allowing the contaminant to be efficiently removed with physical damage suppressed.</p> |
